Characterization of Plasma-Enhanced Chemical Vapor Deposition of Ta2O5 Dielectric Thin Films
碩士 === 國立成功大學 === 材料科學及工程學系 === 87 === The material properties as well as electrical behaviors of tantalum pentoxide (Ta2O5) thin films deposited by plasma-enhanced and low pressure chemical vapor deposition on Si and Pt substrates were investigated. The effectiveness of furnace annealing and plasma...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72469685385441734247 |