The Study of Chemical-Mechanical Polishing Process for Fluorine-Doped Silicon Oxide
碩士 === 國立中興大學 === 電機工程學系 === 87 === The main purpose of this thesis is to investigate the influence of the chemical mechanical polishing process on the fluorine-doped silicon dioxide (SiOF). Since the polarized Si-F bonding of SiOF film is a low resistance material to moisture, it would c...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91685459963255983560 |