The Study of Tunneling Magnetoresistance in 〔Co/AlOX/Ni80Fe20〕

碩士 === 義守大學 === 材料科學與工程學系 === 87 === The tunneling magnetoresistance and magnetization behavior of 【Ta(50 A)/Co(150 A)/Al(10 A~40 A)OX/Ni80Fe20(150 A)/Ta(50 A)】 films with AlOX insulator has been studied in this work. The films were prepared by d.c. magnetron sputtering and the AlOX oxide layer was...

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Bibliographic Details
Main Authors: J. W. Lee, 李智文
Other Authors: L. H. Chen
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/84316090770155626152