Silicon-Containing Positive Photoresist for DUV Lithography

碩士 === 中原大學 === 化學系 === 87 === The hydrophilicity of the ladder-type alkali insoluble polysilsesquioxane(PolyT4) is modified, in this study, through hydroxylation and acetylation to produce OH-PolyT4 and AC-PolyT4, respectively. It is found that AC-PolyT4 is not only alkali soluble but al...

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Bibliographic Details
Main Authors: Song Shiang Lin, 林松香
Other Authors: Yui Whei Chen-Yang
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/42855370834703935465