Analysis of Radiation in LPCVD Furnace
碩士 === 元智大學 === 機械工程研究所 === 86 === Low pressure chemical vapor deposition (LPCVD) process is one of the most important manufacturing processes to make IC circuits. The resulting nonuniform temperature across the wafer during the process is still a problem, especially...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/02066472337477945871 |