Studies on the Synthesis of New Photoresists and their Applications on the Microelectronics Device
碩士 === 大同工學院 === 化學工程研究所 === 86 === In this studying, a monomer with high thermal stability, N-(4-carboxy-phenyl) maleimide (CPMI), were synthesized from the maleic anhydride and p-aminobenzoic acid. Free radical copolymerization of CPMI and three monomers with trimethylsilyl group were p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/18133108777948236491 |