濺鍍冷／熱鋁金屬栓塞製程研究並以電子顯微鏡觀察其材料行為
碩士 === 國立清華大學 === 材料科學與工程學系 === 86 === A cold/hot Al sputtering was processing to fill contact, 0.4 μm open, aspect ratio up to 4 and collimated Ti/TiN was initial deposited following RTP treatment to be barrier layer. Stacks, IMP Ti 80nm/cold Al 200nm/Hot Al 800nm, were deposited without vacuum b...
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| Format: | Others |
| Language: | zh-TW |
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1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52771862644962602156 |