Observation of Gas Flow and Wafer Temperature Measurement in a Model Lamp Heated Vertical CVD Reactor

碩士 === 國立交通大學 === 機械工程研究所 === 86 ===   An experimental lamp heated, rapid thermal, vertical single-wafer reactor was established to study the gas flow and heat transfer driven by the inertia of the inlet flow and the buoyancy due to the wafer heating. Effects of placing a thick copper plate beneath...

Full description

Bibliographic Details
Main Authors: Hsiao, Cheng-Chiu, 蕭澄秋
Other Authors: Lin, Tsing-Fa
Format: Others
Language:en_US
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/37631571590673157762

Similar Items