Observation of Gas Flow and Wafer Temperature Measurement in a Model Lamp Heated Vertical CVD Reactor
碩士 === 國立交通大學 === 機械工程研究所 === 86 === An experimental lamp heated, rapid thermal, vertical single-wafer reactor was established to study the gas flow and heat transfer driven by the inertia of the inlet flow and the buoyancy due to the wafer heating. Effects of placing a thick copper plate beneath...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | en_US |
Published: |
1998
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Online Access: | http://ndltd.ncl.edu.tw/handle/37631571590673157762 |