Observation of Gas Flow and Wafer Temperature Measurement in a Model Lamp Heated Vertical CVD Reactor

• Main Authors: Hsiao, Cheng-Chiu, 蕭澄秋
• Other Authors: Lin, Tsing-Fa
• Format: Others
• Language: en_US
• Published: 1998
• Online Access: http://ndltd.ncl.edu.tw/handle/37631571590673157762

碩士 === 國立交通大學 === 機械工程研究所 === 86 === 　　An experimental lamp heated, rapid thermal, vertical single-wafer reactor was established to study the gas flow and heat transfer driven by the inertia of the inlet flow and the buoyancy due to the wafer heating. Effects of placing a thick copper plate beneath the wafer on the uniformity of the wafer temperature and effects of the showerhead on the resulting flow in the reaction chamber were examined. In particular, the flow patterns in the reactor resulting from a vertical gas jet impinging on the wafer were examined in detail. The results indicated that adding the copper plate can effectively reduce the nonuniformity of the wafer temperature. Besides, using a showerhead with finer holes in it results in a better flow distribution in the reactor. For a jet impinging on the wafer, the buoyancy induces a circular vortex roll surrounding the axis of the chamber right on the wafer. At high buoyancy-to -inertia ratio the vortex roll is highly deformed and nonaxisymmetric. Finally, the generation of new roll by splitting from the original roll was noted during the transient roll formation processes.