Si and GaAs PIN Photodiode Fabrication and Characterrization

碩士 === 國立交通大學 === 光電工程研究所 === 86 ===   In this thesis, we present the fabrication of 0.85um Si and GaAs PIN photodiode. Planar Si PIN photodiode is fabricated by POCL3 diffusion on P-P+ epitaxial wafer. The mesa structure is used in the GaAs PIN photodiode with AlGaAs/GaAs heterojunction. Character...

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Bibliographic Details
Main Authors: Hsiang, Wei-Wei, 項維巍
Other Authors: Tai, Huo-Chou
Format: Others
Language:en_US
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/23659633520810128471