A study of reactive ion etching for the fabrication of heterojunction bipolar transistors and laser diodes
博士 === 國立成功大學 === 電機工程學系 === 86 === Reactive ion etching is the most important technology to thesemiconductor industry. Since, it is needed to reduce the device dimension for VLSI and ULSI technology, anisotropic etchingprocess is very important technique...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/51857556967652744317 |