The Control of the Oxygen Precipitates and Related Micro-defects in Cz Silicon with Low-High Two Step Annealing

碩士 === 國立中興大學 === 材料工程學研究所 === 86 === Two-step and three-step anneals were applied systematically to a set of commer cial Cz silicon wafers. The micro-defects generated during the anneals were decorated with Wright solution and in...

Full description

Bibliographic Details
Main Authors: Tsui, Fu-Ching, 崔福慶
Other Authors: Chung-Yung Kung
Format: Others
Language:zh-TW
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/90990863132272613114