The Fabrication of ACTFEL Device by Double Ion Sources Enhancing Electron Beam Deposition
碩士 === 輔仁大學 === 物理學研究所 === 86 === In our work, we synthesize ZnS thin films containing 5% Mn by Double Ion Sources Enhancing Electron Beam Deposition. Using the insulator material SiO2, and Ta2O5, an electrode Ti by R.F. Sputter, is necessary to fabricate an ACTFEL display device. From results m...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/31001461398933612667 |