Nitridation effect on the barrier property of Mo and Cr layer in Cu/Barrier/SiO2/Si MOS structure
碩士 === 國立交通大學 === 電子工程學系 === 85 === This thesis investigates the nitridation effect on the barrier property of Mo and Cr layer in Cu/barrier/SiO2/Si MOS structure. The MoNx and CrNx fims weresputter deoisited in Ar/N2 mixed gas of various A...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03443599868712718310 |