Effects of Surfactant Additives in BHF on Etching and Cleaning Processes
碩士 === 國立交通大學 === 材料科學與工程研究所 === 85 === BHF is a well-known, Excellent wet-etching regent for silicon dioxides. It cannot perform complete cleaning and etching, however,due to its poor wettability on the wafer surface. In this work, we sti...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52950925906689496988 |