Morphological Stabilities of Chemical Vapor Deposition Films

碩士 === 中原大學 === 機械工程學系 === 85 ===   In this article, we study the influence of variable thermal physical propertics on the three-dimensional morphological stability of Chemical Vapor Deposition (CVD) films under the diffusion-limited condition. First of all, we establish a set of heat-transferred...

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Bibliographic Details
Main Author: 戴遠謀
Other Authors: 黃吉川
Format: Others
Language:zh-TW
Published: 1997
Online Access:http://ndltd.ncl.edu.tw/handle/13961592747436672580