SYNTHESIS OF THE COPOLYMERS CONTAINING TRIMETHYLSILYL GROUP FOR DEEP-UV PHOTORESIST APPLICATION
碩士 === 大同工學院 === 化學工程學系 === 84 === The monomers containing trimethylsilyl group were synthesized through the formation of Gregnard reagent using iodine as the catalyst. To study the effects of the catalyst and reaction time, various synt...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/38337751878324697361 |