Study of Antenna Effect for High-Density Plasma Processing
碩士 === 國立交通大學 === 電子研究所 === 84 === Plasma charge-induced damages to gate oxides are increasingly becoming serious concerns because they directly impact device reliability in ultra-large-scale-integrated circuits. This charging effect...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/40784393923436534699 |