Fuzzy Logic Models with Adaptive Learning Rates and Genetic Algorithm for Thermally Based Microelectronic Manufacturing Processes

碩士 === 國立交通大學 === 控制工程系 === 84 === This paper presents the improved fuzzy logic models (FLM) to simulate the thermally based microelectronic manufacturing process: the silicon deposition process in a barrel chemical vapor deposition...

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Bibliographic Details
Main Authors: Lu, Chi-Fu, 盧啟富
Other Authors: Chiou Jin-Cherng
Format: Others
Language:zh-TW
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/77342210875456884445