A Study of �-SiC/Si Heterojunction Structure for High Temperature and High Voltage Devices Applications
博士 === 國立成功大學 === 電機工程研究所 === 84 === In this thesis, the ?SiC thin films prepared by sputtreing and LP-RTCVD(Low Pressure-Rapid Thermal Chemical Vapor Deposition) have been deposited on Si substrate to fabricate SiC/Si heterojunction device...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/47234956662977788661 |