Study on the Optimization Simulation and Application of Annular Off-Axis Illumination and Attenuated Phase Shift Mask
碩士 === 國立交通大學 === 應用化學系 === 83 === Off-Axis Illumination (OAI) has several merits when applied to microlithography. The most important merit is that depth of focus could be largely improved while conventional i-line process remain unchanged...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85104331387172750793 |