Effects on device characteristics of CMP planarization process
碩士 === 國立交通大學 === 電子研究所 === 83 === CMP planarization process is more and more important on multilevel structure for resent years. In this thesis, we investigated the effects of CMP on the underlying dielectric films reliability by studing o...
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13172418208941317882 |