Effect of W barrier in the Al/Barrier/p+n diodes
碩士 === 國立交通大學 === 電子研究所 === 83 === This thesis studies the thermal stability of W contacted p+n junction diodes using the selective CVD W with the silane reduction process. For the Al/W/p+n diode with a W layer of 100nm, the device was abl...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93704559782332997391 |