Polysilicon etching technology with halogen bearing ECR plasmas
碩士 === 國立交通大學 === 電子研究所 === 83 === In this thesis, we investigate the polysilicon etching characteristics with halogen bearing ECR plasmas. The investigations include etch rate, anisotropy, selectivity, surface morphology, and the oxide dam...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81892756377534443852 |