Recrystallization and Dopant Activation of LPCVD Silicon Films and the Characterization of Poly-Si Thin Film Transistors
博士 === 國立交通大學 === 電子研究所 === 83 === In this thesis, the grain growth mechanisms of low-pressure chemical vapor deposition (LPCVD) silicon films, the dopant activation of implanted ions in poly-Si layers,and the electrical characteristics as well as the pa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83916018274403690497 |