Study of Etching Damages Induced by Reactive-Ion-Etching and Electron Cyclotron Resonance Etching on the Silicon Substrates
博士 === 國立交通大學 === 電子研究所 === 83 === In this thesis, we study the properties of thin oxides thermally grown on reactive-ion-etched (RIE) silicon substrates in N2O and diluted O2 ambient. The interface microroughness is strongly dependent on the RIE conditio...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54938753342994590641 |