The measurement of hydrogen concentration and void fraction of the a-Si:H film
碩士 === 國立清華大學 === 材料科學(工程)研究所 === 82 ===
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1994
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ndltd-TW-082NTHU01590552016-07-18T04:09:48Z http://ndltd.ncl.edu.tw/handle/40826399224862334225 The measurement of hydrogen concentration and void fraction of the a-Si:H film 含氫非晶矽膜氫含量與空孔的量測 Hsieh, Ren Guey 謝仁貴 碩士 國立清華大學 材料科學(工程)研究所 82 Gan Jon Yiew 甘炯耀 1994 學位論文 ; thesis 0 zh-TW |
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zh-TW |
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Others
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碩士 === 國立清華大學 === 材料科學(工程)研究所 === 82 ===
|
author2 |
Gan Jon Yiew |
author_facet |
Gan Jon Yiew Hsieh, Ren Guey 謝仁貴 |
author |
Hsieh, Ren Guey 謝仁貴 |
spellingShingle |
Hsieh, Ren Guey 謝仁貴 The measurement of hydrogen concentration and void fraction of the a-Si:H film |
author_sort |
Hsieh, Ren Guey |
title |
The measurement of hydrogen concentration and void fraction of the a-Si:H film |
title_short |
The measurement of hydrogen concentration and void fraction of the a-Si:H film |
title_full |
The measurement of hydrogen concentration and void fraction of the a-Si:H film |
title_fullStr |
The measurement of hydrogen concentration and void fraction of the a-Si:H film |
title_full_unstemmed |
The measurement of hydrogen concentration and void fraction of the a-Si:H film |
title_sort |
measurement of hydrogen concentration and void fraction of the a-si:h film |
publishDate |
1994 |
url |
http://ndltd.ncl.edu.tw/handle/40826399224862334225 |
work_keys_str_mv |
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