The measurement of hydrogen concentration and void fraction of the a-Si:H film

碩士 === 國立清華大學 === 材料科學(工程)研究所 === 82 ===

Bibliographic Details
Main Authors: Hsieh, Ren Guey, 謝仁貴
Other Authors: Gan Jon Yiew
Format: Others
Language:zh-TW
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/40826399224862334225
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spelling ndltd-TW-082NTHU01590552016-07-18T04:09:48Z http://ndltd.ncl.edu.tw/handle/40826399224862334225 The measurement of hydrogen concentration and void fraction of the a-Si:H film 含氫非晶矽膜氫含量與空孔的量測 Hsieh, Ren Guey 謝仁貴 碩士 國立清華大學 材料科學(工程)研究所 82 Gan Jon Yiew 甘炯耀 1994 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學(工程)研究所 === 82 ===
author2 Gan Jon Yiew
author_facet Gan Jon Yiew
Hsieh, Ren Guey
謝仁貴
author Hsieh, Ren Guey
謝仁貴
spellingShingle Hsieh, Ren Guey
謝仁貴
The measurement of hydrogen concentration and void fraction of the a-Si:H film
author_sort Hsieh, Ren Guey
title The measurement of hydrogen concentration and void fraction of the a-Si:H film
title_short The measurement of hydrogen concentration and void fraction of the a-Si:H film
title_full The measurement of hydrogen concentration and void fraction of the a-Si:H film
title_fullStr The measurement of hydrogen concentration and void fraction of the a-Si:H film
title_full_unstemmed The measurement of hydrogen concentration and void fraction of the a-Si:H film
title_sort measurement of hydrogen concentration and void fraction of the a-si:h film
publishDate 1994
url http://ndltd.ncl.edu.tw/handle/40826399224862334225
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