Effects of Plasma-Treatments of a-SiOxNy/a-SiNx Double Gate- Insulators on a-Si:H Thin-Film Transistors
碩士 === 國立中央大學 === 資訊及電子工程研究所 === 82 === To study the effects of plasma-treatments of a-SiOxNy/a-SiNx gate-insulators on the hydrogenated amorphous silicon thin-film transistors (a-Si:H TFTs), four kinds of a-Si:H TFTs: (1) without, (2) with...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/05973404312053682848 |