Growth of Silicon Carbide Thin Films from Tris(trimethylsilyl) silane by Low Pressure Chemical Vapor Deposition
碩士 === 國立交通大學 === 應用化學研究所 === 82 ===
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
1994
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Online Access: | http://ndltd.ncl.edu.tw/handle/01602784900504230147 |