Growth of Silicon Carbide Thin Films from Tris(trimethylsilyl) silane by Low Pressure Chemical Vapor Deposition

碩士 === 國立交通大學 === 應用化學研究所 === 82 ===

Bibliographic Details
Main Authors: Chen, Yi-Wen, 陳奕文
Other Authors: Qiu, Xing-Tian
Format: Others
Language:zh-TW
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/01602784900504230147