Characterization and device applications of polycrystalline si and Si1-xGex films grown by ultra-high vacuum chemical vapor deposition
博士 === 國立交通大學 === 電子研究所 === 82 ===
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1994
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/00219571885495604410 |