Rapid Thermal Oxidation of Silicon in N2O : Growth Kinetics and Device Applications
碩士 === 國立交通大學 === 電子研究所 === 82 === This thesis presents two major areas of research: chemical mecha- nical polishing and rapid thermal oxidation. Chemical mechanical polishing (CMP) recently has emerged as a new element in ultra large s...
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| Format: | Others |
| Language: | en_US |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/38396801081133990371 |