Etching of ITO and Effect of Ion Etching on the Electrical Characteristics of ITO/Si Heterojunction
碩士 === 國立交通大學 === 電子研究所 === 82 === Indium tin oxide (ITO) films were deposited onto unheated substrates with r.f. magentron sputtering. The etching characteristics of ITO fimls deposited in various oxygen partial pressures in the sputtering...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/17337994893207401904 |