| Summary: | 碩士 === 國立成功大學 === 材料科學(工程)研究所 === 82 === A planar magnetron sputtering system with cathode and anode
cooled by water was established.Under 1700V and 50 mtorr argon
working pressure ,high carbon contented Fe-C (C:50.1-75.5at%)
and Fe-C-X(X=Sb,Ti,V)(C:54.3-79.5 at%, Fe:8.4-43.5at%,
Sb:5.8-37.3at%,Ti:2.0-4.6at%,V:0.2-3.5 at%) ternary alloy films
are produced.All films have island-like surface morphology
under the observation of STM.As carbon content increases ,the
structure changes from .alpha. iron to cementite and/or .kai.
carbide(see appendix),when carbon content reaches 75.5 at%, no
obvious X-ray diffraction peaks appear. The ternary alloys
include two groups, one has cemen- tite and/or .kai. carbide,
the other has microcrystalline kai carbide or near amorphous
structure. All films have in-plane anisotropy. The
magnetization at 14KOe applied field is 398.4-855.9emu/cc for
Fe-C films and 94-680 emu/cc for Fe-C-X films, the quantity
decreases as the composition moves towards higher carbon and/or
alloying element content regions on ternary phase diagram.
The coer- civity of Fe-C films increases with carbon content
maybe owing to crystal anisotropy and internal stress in films.
The in- plane coercivity is about 191.7-391.7 Oe for Fe-C
binary and Ti or V contented ternary films. Sb contented films
have higher coercivity up to 758.3 Oe,it maybe related to the
higher inter- nal stress caused by Sb atoms because of larger
atomic volume . For the sake of no perpendicular anisotropy,
the squareness perpendicular to the film plane is about
0.03-0.211. The Kerr angle measured at 6328 angstrom wavelength
is about 0.005-0.1 degree. The reflectance is about
0.5173-0.6764, which increases with carbon content at first and
then decrease. The figure of merit is about 0.0039- 0.082
degree.
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