Growth of Diamond Thin Film by Triode Hollow Cathode Discharge Plasma Chemical Vapor Deposition
碩士 === 國立成功大學 === 化學工程研究所 === 82 === The Hollow Cathode Discharge Chemical Vapor Deposition system was first employed to grow diamond thin films in this thesis. However, the growth of diamond films was interfered by the high temperature operation of elect...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68095382454921696593 |