Characterization and Properties of TiNi shape Memory Alloy Film Prepared by Magnetron Sputtering System
碩士 === 大同工學院 === 材料科學(工程)研究所 === 81 === The sputtering deposition process of TiNi alloy thin films via a R.F. magnetron sputter were studied. The as-deposited films were amorphous in structure and did not exhibit shape memory alloy characte...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36010338847396358249 |