| Summary: | 碩士 === 國立臺灣科技大學 === 工程技術研究所 === 81 === The successful application of synchrotron radiation for
microlithography requires an efficient beamline as the
transport system which connects the electron storage ring to
the lithographic exposure station. A typical X-ray lithography
beamline mainly consists of illumination optics and mechanical
system. To insure adequate utilization of lithography beamline,
the former is the primary issue that must be optimized to match
lithographic needs. The purpose of the present investigation is
to establish the optimum configuration of X-ray optics in a
proposed beamline structure. The lithography beamline proposed
herein includes three major optical components:(1) the SiC-
coated grazing mirror, which serves as the low-pass filter to
cutoff short wavelength radiation;(2) the silicon filter, which
employed to absorb ultraviolet and infrared light; and (3) the
beryllium (Be) window, which acts not only as the high-pass
filter, but also behaves as the vacuum isolator to maintain the
vacuum section of beamline system. By using an X-ray optics ray-
tracing program named SHADOW, which is developed especially for
beamline modeling and simulation, the important optical data of
beamline optics were calculated. In this study, the
specification of the electron storage ring at Synchrotron
Radiation Research Center(SRRC) was used as the input data of
radiation source. After the relevant parameters concering
synchrotron source and optical system were specified, the
photon beam was generated and traced through the optical system
proposed herein. In the case of the 1.3GeV SRRC storage ring,
the vertical spread of the photon beam is approximately
0.79mrad, which produces a beam height about 0.86cm on the
wafer plane if a 11m source- wafer distance is assumed as the
total beam path length. The beam shape and the radiation
divergence (i.e. the beam horizontal and vertical divergences)
in the wafer plane were simulated in the present study. Results
of the simulations show
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