The effect of si film annealing for surface roughness, Thickness,and void fraction.
碩士 === 國立清華大學 === 材料科學工程研究所 === 81 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25904235266288274477 |