DEEP-UV LITHOGRAPHY FOR SUBMICRON GATE TECHNOLOGY
碩士 === 國立交通大學 === 材料科學(工程)研究所 === 81 === A process for fabricating submicron T-shaped gate using deep-UV lithography has been developed. Two kinds of LO/HI/LO sensitivity trilayer resist system were used to provide T- shaped resist cavity w...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35716493854781828229 |