Study on the effects of titanium mononitride (TiN) as an antireflection layer (ARL) in submicron-lithography
碩士 === 國立交通大學 === 應用化學研究所 === 79 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1991
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37934117918881062046 |