Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments

Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments

碩士 === 國立臺灣大學 === 電機工程研究所 === 78 ===

Bibliographic Details
Main Authors:	CHEN,REN-DE, 陳仁德
Other Authors:	HU,ZHEN-GUO
Format:	Others
Language:	zh-TW
Published:	1990
Online Access:	http://ndltd.ncl.edu.tw/handle/13739816151296599324

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