Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
碩士 === 國立臺灣大學 === 電機工程研究所 === 78 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1990
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13739816151296599324 |