Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments

碩士 === 國立臺灣大學 === 電機工程研究所 === 78 ===

Bibliographic Details
Main Authors: CHEN,REN-DE, 陳仁德
Other Authors: HU,ZHEN-GUO
Format: Others
Language:zh-TW
Published: 1990
Online Access:http://ndltd.ncl.edu.tw/handle/13739816151296599324
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spelling ndltd-TW-078NTU024420252016-07-27T04:14:32Z http://ndltd.ncl.edu.tw/handle/13739816151296599324 Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments 以重覆輻射—退火處理改善氧化層介面特性 CHEN,REN-DE 陳仁德 碩士 國立臺灣大學 電機工程研究所 78 HU,ZHEN-GUO 胡振國 1990 學位論文 ; thesis 48 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立臺灣大學 === 電機工程研究所 === 78 ===
author2 HU,ZHEN-GUO
author_facet HU,ZHEN-GUO
CHEN,REN-DE
陳仁德
author CHEN,REN-DE
陳仁德
spellingShingle CHEN,REN-DE
陳仁德
Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
author_sort CHEN,REN-DE
title Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
title_short Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
title_full Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
title_fullStr Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
title_full_unstemmed Improvement of the interfacial properties of SiO2^^by repeated irradiation-then-anneal treatments
title_sort improvement of the interfacial properties of sio2^^by repeated irradiation-then-anneal treatments
publishDate 1990
url http://ndltd.ncl.edu.tw/handle/13739816151296599324
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