Shallow junction formation using implantation of BF2 ions through poly-Si film

碩士 === 國立交通大學 === 電子研究所 === 78 ===

Bibliographic Details
Main Authors: ZHAN,SHANG-TANG, 詹尚堂
Other Authors: ZHENG,HUANG-ZHONG
Format: Others
Language:zh-TW
Published: 1991
Online Access:http://ndltd.ncl.edu.tw/handle/22782544989860662694
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spelling ndltd-TW-078NCTU24301322015-10-13T15:21:05Z http://ndltd.ncl.edu.tw/handle/22782544989860662694 Shallow junction formation using implantation of BF2 ions through poly-Si film 藉二氟化硼離子佈植於複晶矽中以形成淺接面 ZHAN,SHANG-TANG 詹尚堂 碩士 國立交通大學 電子研究所 78 ZHENG,HUANG-ZHONG 鄭晃忠 1991 學位論文 ; thesis 24 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 電子研究所 === 78 ===
author2 ZHENG,HUANG-ZHONG
author_facet ZHENG,HUANG-ZHONG
ZHAN,SHANG-TANG
詹尚堂
author ZHAN,SHANG-TANG
詹尚堂
spellingShingle ZHAN,SHANG-TANG
詹尚堂
Shallow junction formation using implantation of BF2 ions through poly-Si film
author_sort ZHAN,SHANG-TANG
title Shallow junction formation using implantation of BF2 ions through poly-Si film
title_short Shallow junction formation using implantation of BF2 ions through poly-Si film
title_full Shallow junction formation using implantation of BF2 ions through poly-Si film
title_fullStr Shallow junction formation using implantation of BF2 ions through poly-Si film
title_full_unstemmed Shallow junction formation using implantation of BF2 ions through poly-Si film
title_sort shallow junction formation using implantation of bf2 ions through poly-si film
publishDate 1991
url http://ndltd.ncl.edu.tw/handle/22782544989860662694
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