Characterization of Si and Sil-xGex epilayers grown by RTCBE
碩士 === 國立交通大學 === 材料科學工程研究所 === 78 ===
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1991
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ndltd-TW-078NCTU21590022015-10-13T15:21:04Z http://ndltd.ncl.edu.tw/handle/45243747351920613878 Characterization of Si and Sil-xGex epilayers grown by RTCBE 以快速升溫化學束磊晶法成長矽鍺磊晶及其特性分析 WANG,ZHENG-TANG 王政堂 碩士 國立交通大學 材料科學工程研究所 78 ZHANG,JUN-YAN LIU,ZENG-FENG 張俊彥 劉增豐 1991 學位論文 ; thesis 67 zh-TW |
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zh-TW |
format |
Others
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NDLTD |
description |
碩士 === 國立交通大學 === 材料科學工程研究所 === 78 ===
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author2 |
ZHANG,JUN-YAN |
author_facet |
ZHANG,JUN-YAN WANG,ZHENG-TANG 王政堂 |
author |
WANG,ZHENG-TANG 王政堂 |
spellingShingle |
WANG,ZHENG-TANG 王政堂 Characterization of Si and Sil-xGex epilayers grown by RTCBE |
author_sort |
WANG,ZHENG-TANG |
title |
Characterization of Si and Sil-xGex epilayers grown by RTCBE |
title_short |
Characterization of Si and Sil-xGex epilayers grown by RTCBE |
title_full |
Characterization of Si and Sil-xGex epilayers grown by RTCBE |
title_fullStr |
Characterization of Si and Sil-xGex epilayers grown by RTCBE |
title_full_unstemmed |
Characterization of Si and Sil-xGex epilayers grown by RTCBE |
title_sort |
characterization of si and sil-xgex epilayers grown by rtcbe |
publishDate |
1991 |
url |
http://ndltd.ncl.edu.tw/handle/45243747351920613878 |
work_keys_str_mv |
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