The analysis of properties of WO3 films manufactured by rf sputtering

The analysis of properties of WO3 films manufactured by rf sputtering

碩士 === 國立成功大學 === 物理研究所 === 78 ===

Bibliographic Details
Main Authors:	HUANG,SHENG-KAI, 黃勝凱
Other Authors:	LI,YU-HUA
Format:	Others
Language:	zh-TW
Published:	1990
Online Access:	http://ndltd.ncl.edu.tw/handle/26033807255747990860

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