The analysis of properties of WO3 films manufactured by rf sputtering

碩士 === 國立成功大學 === 物理研究所 === 78 ===

Bibliographic Details
Main Authors: HUANG,SHENG-KAI, 黃勝凱
Other Authors: LI,YU-HUA
Format: Others
Language:zh-TW
Published: 1990
Online Access:http://ndltd.ncl.edu.tw/handle/26033807255747990860