Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations

博士 === 國立交通大學 === 電子研究所 === 75 ===

Bibliographic Details
Main Authors:	CAI, HONG-XIANG, 蔡泓祥
Other Authors:	WU, GING-YUAN
Format:	Others
Language:	zh-TW
Published:	1987
Online Access:	http://ndltd.ncl.edu.tw/handle/37372030114937365630

id	ndltd-TW-075NCTU2430009
record_format	oai_dc
spelling	ndltd-TW-075NCTU24300092016-02-12T04:10:33Z http://ndltd.ncl.edu.tw/handle/37372030114937365630 Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations 熱氮化薄二氧化矽膜在超大型互補式金氧半場效電晶體之閘及新場絕緣上的應用─新技術及其評估 CAI, HONG-XIANG 蔡泓祥博士國立交通大學電子研究所 75 WU, GING-YUAN 吳慶源 1987 學位論文 ; thesis 0 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	博士 === 國立交通大學 === 電子研究所 === 75 ===
author2	WU, GING-YUAN
author_facet	WU, GING-YUAN CAI, HONG-XIANG 蔡泓祥
author	CAI, HONG-XIANG 蔡泓祥
spellingShingle	CAI, HONG-XIANG 蔡泓祥 Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
author_sort	CAI, HONG-XIANG
title	Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
title_short	Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
title_full	Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
title_fullStr	Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
title_full_unstemmed	Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
title_sort	thermally nitrided thin-oxide films for gate and novel field isolation applications in cmos/vlsi:new technologies and their evaluations
publishDate	1987
url	http://ndltd.ncl.edu.tw/handle/37372030114937365630
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Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations

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