Thermally nitrided thin-oxide films for gate and novel field isolation applications in CMOS/VLSI:new technologies and their evaluations
博士 === 國立交通大學 === 電子研究所 === 75 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1987
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37372030114937365630 |