Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition

Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition

Bibliographic Details
Main Author: Carbaugh, Daniel J.
Language:English
Published: Ohio University / OhioLINK 2014
Subjects:
Electrical Engineering
Nanoscience
Nanotechnology
Materials Science
PECVD
Plasma Enhanced Chemical Vapor Deposition
Silicon Dioxide
Silicon Nitride
Silicon Oxynitride
Thin Films
Online Access:http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1406644891

Internet

http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1406644891

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